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The article
Low-temperature fabrication of sputtered high-k HfO2 gate dielectric for flexible a-IGZO thin film transistors
Rihui Yao, Zeke Zheng, Mei Xiong, Xiaochen Zhang, Xiaoqing Li, Honglong Ning and 4 more
- Rank
- 73 of 2,351
- Percentile
- top 3.2%
- Where
- Applied Physics Letters, 2018
- Citations
- 113
From the 2018 list, OpenAlex counts as of 2026-10-29.
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