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The article
Effect of film thickness on the ferroelectric and dielectric properties of low-temperature (400 °C) Hf0.5Zr0.5O2 films
Si Joon Kim, Jaidah Mohan, Jaebeom Lee, Joy S. Lee, Antonio Tomas Lucero, Chadwin Delin Young and 4 more
- Rank
- 19 of 2,351
- Percentile
- top 0.9%
- Where
- Applied Physics Letters, 2018
- Citations
- 172
From the 2018 list, OpenAlex counts as of 2026-10-29.
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