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The article

Atomic Layer Deposition of Cobalt Using H₂-, N₂-, and NH₃-Based Plasmas: On the Role of the Co-reactant

Martijn F. J. Vos, Gerben van Straaten, W. M. M. Kessels, Adriaan J. M. Mackus

Rank
7 of 546
Percentile
top 1.3%
Where
The Journal of Physical Chemistry, 2018
Citations
9

From the 2018 list, OpenAlex counts as of 2026-10-29.

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