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The article
Ferroelectricity of nondoped thin HfO 2 films in TiN/HfO 2 /TiN stacks
Tomonori Nishimura, Lun Xu, Shigehisa Shibayama, Takeaki Yajima, Shinji Migita, Akira Toriumi
- Rank
- 14 of 1,533
- Percentile
- top 1%
- Where
- Japanese Journal of Applied Physics, 2016
- Citations
- 102
From the 2016 list, OpenAlex counts as of 2026-10-29.
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