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The article

Electron channel mobility in silicon-doped Ga 2 O 3 MOSFETs with a resistive buffer layer

Man Hoi Wong, Kohei Sasaki, Akito Kuramata, Shigenobu S. Yamakoshi, Masataka Higashiwaki

Rank
5 of 1,533
Percentile
top 0.4%
Where
Japanese Journal of Applied Physics, 2016
Citations
130

From the 2016 list, OpenAlex counts as of 2026-10-29.

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