Your Top 50 most-cited badge
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The article
Atomic layer etching of silicon nitride using cyclic process with hydrofluorocarbon chemistry
Yohei Ishii, Kazumasa Okuma, Tiffany Saldana, Kenji Maeda, Nobuyuki Negishi, Jim Manos
- Rank
- 30 of 1,269
- Percentile
- top 2.4%
- Where
- Japanese Journal of Applied Physics, 2017
- Citations
- 56
From the 2017 list, OpenAlex counts as of 2026-10-29.
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