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The article
Atomic layer etching of silicon nitride using infrared annealing for short desorption time of ammonium fluorosilicate
Nobuya Miyoshi, Hiroyuki Kobayashi, Kazunori K. Shinoda, Masaru Kurihara, Tomoyuki Watanabe, Yutaka Kouzuma and 3 more
- Rank
- 26 of 1,269
- Percentile
- top 2.1%
- Where
- Japanese Journal of Applied Physics, 2017
- Citations
- 62
From the 2017 list, OpenAlex counts as of 2026-10-29.
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