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The article

Atomic layer etching of GaN and AlGaN using directional plasma-enhanced approach

Tomihito Ohba, Wenbing Yang, Samantha Tan, Keren J. Kanarik, Kazuo Nojiri

Rank
15 of 1,269
Percentile
top 1.2%
Where
Japanese Journal of Applied Physics, 2017
Citations
77

From the 2017 list, OpenAlex counts as of 2026-10-29.

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