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The article

Stoichiometric control for heteroepitaxial growth of smooth ε-Ga 2 O 3 thin films on c -plane AlN templates by mist chemical vapor deposition

Daisuke Tahara, Hiroyuki Nishinaka, Shota Morimoto, Masahiro Yoshimoto

Rank
10 of 1,269
Percentile
top 0.8%
Where
Japanese Journal of Applied Physics, 2017
Citations
89

From the 2017 list, OpenAlex counts as of 2026-10-29.

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