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The article
UV–vis spectroscopy study of plasma-activated water: Dependence of the chemical composition on plasma exposure time and treatment distance
Jun‐Seok Oh, Endre J. Szili, Kotaro Ogawa, Robert D. Short, Masafumi Ito, Hiroshi Furuta and 1 more
- Rank
- 4 of 1,269
- Percentile
- top 0.4%
- Where
- Japanese Journal of Applied Physics, 2017
- Citations
- 120
From the 2017 list, OpenAlex counts as of 2026-10-29.
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