Your Top 50 most-cited badge
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The article
Effects of acid diffusion and resist molecular size on line edge roughness for chemically amplified resists in EUV lithography: computational study
Masanori Koyama, Kyohei Imai, Masamitsu Shirai, Yoshihiko Hirai, Masaaki Yasuda
- Rank
- 50 of 876
- Percentile
- top 5.8%
- Where
- Japanese Journal of Applied Physics, 2021
- Citations
- 21
From the 2021 list, OpenAlex counts as of 2026-10-29.
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