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The article

Application of machine learning to stochastic effect analysis of chemically amplified resists used for extreme ultraviolet lithography

Kazuki Azumagawa, Takahiro Kozawa

Rank
43 of 876
Percentile
top 5%
Where
Japanese Journal of Applied Physics, 2021
Citations
23

From the 2021 list, OpenAlex counts as of 2026-10-29.

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