Your Top 50 most-cited badge
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The article
Novel technology of high-aspect-ratio etch utilizing coverage-controllable atomic layer deposition
Sho Kumakura, Hironari Sasagawa, Tetsuya Nishizuka, Yoshihide Kihara, Masanobu Honda
- Rank
- 36 of 885
- Percentile
- top 4.1%
- Where
- Japanese Journal of Applied Physics, 2022
- Citations
- 20
From the 2022 list, OpenAlex counts as of 2026-10-29.
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