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The article
Applying stochastic simulation to study defect formation in EUV photoresists
Lawrence S. Melvin, Ulrich Welling, Yudhishthir Kandel, Zac A. Levinson, Hironobu Taoka, Hans-Jürgen Stock and 1 more
- Rank
- 34 of 885
- Percentile
- top 3.9%
- Where
- Japanese Journal of Applied Physics, 2022
- Citations
- 21
From the 2022 list, OpenAlex counts as of 2026-10-29.
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