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The article
Uniformity improvement of thickness and net donor concentration in halide vapor phase epitaxial β-Ga2O3 wafers prepared on miscut angle substrates
Chia-Hung Lin, Kentaro Ema, Satoshi Masuya, Quang Tu Thieu, Ryoichi Sakaguchi, Kohei Sasaki and 1 more
- Rank
- 40 of 842
- Percentile
- top 4.8%
- Where
- Japanese Journal of Applied Physics, 2023
- Citations
- 16
From the 2023 list, OpenAlex counts as of 2026-10-29.
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