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The article
Highly selective isotropic gas-phase etching of SiO2 using HF and methanol at temperatures –30 °C and lower
Takashi Hattori, Hiroyuki Kobayashi, H. Ohtake, K. Akinaga, Yosuke Kurosaki, A. Takei and 4 more
- Rank
- 35 of 842
- Percentile
- top 4.2%
- Where
- Japanese Journal of Applied Physics, 2023
- Citations
- 17
From the 2023 list, OpenAlex counts as of 2026-10-29.
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