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The article
Effects of ion implantation process on defect distribution in SiC SJ-MOSFET
Takuya Fukui, Tatsuya Ishii, Takeshi Tawara, Kensuke Takenaka, Masashi Kato
- Rank
- 17 of 842
- Percentile
- top 2.1%
- Where
- Japanese Journal of Applied Physics, 2023
- Citations
- 24
From the 2023 list, OpenAlex counts as of 2026-10-29.
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