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The article
Atomic layer deposition and its derivatives for extreme ultraviolet (EUV) photoresist applications
Dan N. Le, Taehee Park, Su Min Hwang, Jin-Hyun Kim, Yong Chan Jung, Nikhil M. Tiwale and 6 more
- Rank
- 14 of 842
- Percentile
- top 1.7%
- Where
- Japanese Journal of Applied Physics, 2023
- Citations
- 26
From the 2023 list, OpenAlex counts as of 2026-10-29.
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