Your Top 50 most-cited badge
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The article
Review and perspective of dry etching and deposition process modeling of Si and Si dielectric films for advanced CMOS device applications
Nobuyuki Kuboi
- Rank
- 23 of 758
- Percentile
- top 3.1%
- Where
- Japanese Journal of Applied Physics, 2024
- Citations
- 11
From the 2024 list, OpenAlex counts as of 2026-10-29.
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