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The article

Mask innovations on the eve of high NA EUV lithography

Vicky Philipsen, Andreas Frommhold, Devesh Thakare, Guillaume Libeert, Inhwan Lee, Joern-Holger Franke and 8 more

Rank
19 of 758
Percentile
top 2.6%
Where
Japanese Journal of Applied Physics, 2024
Citations
12

From the 2024 list, OpenAlex counts as of 2026-10-29.

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