Your Top 10 most-cited badge
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The article
High aspect ratio SiO2/SiN (ON) stacked layer etching using C3HF5, C4H2F6, and C4H4F6
C. Abe, Toshiyuki Sasaki, Y. Kondo, S. Yoshinaga, Shuichi Kuboi, Yutaka Takahashi and 4 more
- Rank
- 10 of 758
- Percentile
- top 1.4%
- Where
- Japanese Journal of Applied Physics, 2024
- Citations
- 14
From the 2024 list, OpenAlex counts as of 2026-10-29.
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