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The article
Reactive sputtering of ferroelectric AlScN films with H2 gas flow for endurance improvement
Si-Meng Chen, Takuya Hoshii, Hitoshi Wakabayashi, Kazuo Tsutsui, Edward Yi Chang, Hitoshi Wakabayashi
- Rank
- 4 of 758
- Percentile
- top 0.6%
- Where
- Japanese Journal of Applied Physics, 2024
- Citations
- 22
From the 2024 list, OpenAlex counts as of 2026-10-29.
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