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The article
Plasma-free dry etching of (001) β-Ga2O3 substrates by HCl gas
Takayoshi Oshima, Yuichi Oshima
- Rank
- 96 of 2,414
- Percentile
- top 4%
- Where
- Applied Physics Letters, 2023
- Citations
- 35
From the 2023 list, OpenAlex counts as of 2026-10-29.
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