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The article

Understanding ferroelectric Al:HfO2 thin films with Si-based electrodes for 3D applications

Karine Florent, Simone Lavizzari, Mihaela Ioana Popovici, L. Di Piazza, Umberto Celano, G. Groeseneken and 1 more

Rank
68 of 2,289
Percentile
top 3%
Where
Journal of Applied Physics, 2017
Citations
83

From the 2017 list, OpenAlex counts as of 2026-10-29.

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