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The article

Kinetic pathway of the ferroelectric phase formation in doped HfO2 films

Lun Xu, Tomonori Nishimura, Shigehisa Shibayama, Takeaki Yajima, Shinji Migita, Akira Toriumi

Rank
11 of 2,289
Percentile
top 0.5%
Where
Journal of Applied Physics, 2017
Citations
219

From the 2017 list, OpenAlex counts as of 2026-10-29.

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