Your Top 50 most-cited badge
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The article
Cryogenic etching of silicon compounds using a CHF3 based plasma
Rémi Dussart, Rim Ettouri, Jack Nos, Gaëlle Antoun, Thomas Tillocher, Philippe Lefaucheux
- Rank
- 34 of 1,589
- Percentile
- top 2.2%
- Where
- Journal of Applied Physics, 2023
- Citations
- 34
From the 2023 list, OpenAlex counts as of 2026-10-29.
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