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The article

The effect of stress on HfO2-based ferroelectric thin films: A review of recent advances

Runhao Han, Peizhen Hong, Shuai Ning, Qiang Xu, Mingkai Bai, Jing En Zhou and 5 more

Rank
19 of 1,589
Percentile
top 1.2%
Where
Journal of Applied Physics, 2023
Citations
43

From the 2023 list, OpenAlex counts as of 2026-10-29.

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